Hot-carrier degradation behavior of thin-film SOI nMOSFET with isolation scheme and buried oxide thickness

✍ Scribed by Jong-Wook Lee; Hyung-Ki Kim; Woo-Han Lee; Min-Rok Oh; Yo-Hwan Koh

• Book ID: 114538154
• Publisher: IEEE
• Year: 2000
• Tongue: English
• Weight: 178 KB
• Volume: 47
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.841235