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Homoleptic Tin and Silicon Amido Compounds as Precursors for Low-Temperature Atmospheric Pressure Chemical Vapor Deposition of Tin and Silicon Oxide Thin Films

✍ Scribed by Atagi, Lauren M.; Hoffman, David M.; Liu, Jia-Rui; Zheng, Zongshuang; Chu, Wei-Kan; Rubiano, Rodrigo R.; Springer, Robert W.; Smith, David C.

Book ID: 126032982
Publisher: American Chemical Society
Year: 1994
Tongue: English
Weight: 276 KB
Volume: 6
Category: Article
ISSN: 0897-4756
DOI: 10.1021/cm00040a005

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