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Effects of temperature and electrical stress on the performance of thin-film transistors fabricated from undoped low-pressure chemical vapor deposited polycrystalline silicon

✍ Scribed by Dimitriadis, C. A.; Coxon, P. A.

Book ID: 120460067
Publisher: American Institute of Physics
Year: 1989
Tongue: English
Weight: 537 KB
Volume: 54
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.100897

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