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Synthesis of thin films by atmospheric pressure chemical vapor deposition using amido and imido titanium(IV) compounds as precursors

✍ Scribed by Fix, Renaud M.; Gordon, Roy G.; Hoffman, David M.

Book ID: 127233146
Publisher: American Chemical Society
Year: 1990
Tongue: English
Weight: 894 KB
Volume: 2
Category: Article
ISSN: 0897-4756
DOI: 10.1021/cm00009a010

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