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Holographic approach to phase conjugation of optical near fields

โœ Scribed by Vohnsen, Brian; Bozhevolnyi, Sergey I.


Book ID
115388119
Publisher
Optical Society of America
Year
1997
Tongue
English
Weight
632 KB
Volume
14
Category
Article
ISSN
1084-7529

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๐Ÿ“œ SIMILAR VOLUMES


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โœ Bozhevolnyi, Sergey I.; Keller, Ole; Smolyaninov, Igor I. ๐Ÿ“‚ Article ๐Ÿ“… 1994 ๐Ÿ› Optical Society of America ๐ŸŒ English โš– 580 KB
Electron beam lithography of phase mask
โœ X. Liu; J.S. Aitchison; R.M. De La Rue; S. Thoms; L. Zhang; J.A.R. Williams; I. ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 340 KB

This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groo