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Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

✍ Scribed by X. Liu; J.S. Aitchison; R.M. De La Rue; S. Thoms; L. Zhang; J.A.R. Williams; I. Bennion

Publisher: Elsevier Science
Year: 1997
Tongue: English
Weight: 340 KB
Volume: 35
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(96)00102-5

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✦ Synopsis

This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.

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