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Holmium redistribution upon solid-phase epitaxial crystallization of amorphized silicon layers

โœ Scribed by O. V. Aleksandrov; Yu. A. Nikolaev; N. A. Sobolev

Book ID
110120292
Publisher
Springer
Year
2000
Tongue
English
Weight
64 KB
Volume
34
Category
Article
ISSN
1063-7826

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โœ Christoph Zechner; Dmitri Matveev; Axel Erlebach ๐Ÿ“‚ Article ๐Ÿ“… 2004 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 94 KB

Silicon regions amorphized by high dose ion implantation recrystallize under high temperature treatment. Driven by a lower configuration energy of dopant atoms in the amorphized phase than in the crystalline phase, dopant atoms are pushed in the direction of recrystallization during solid phase epit