High density large area hydrogen plasma
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Jeonghee Cho; Jack Yang; Haejung Park; Se-Geun Park
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Article
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2010
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Elsevier Science
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English
⚖ 316 KB
Hydrogen plasma becomes an alternative to the conventional oxygen plasma in stripping photoresist in the next generation semiconductor processing because the conventional oxygen plasma is known to degrade ultralow dielectric constant films by depleting carbons from the films. An array of hollow cath