Material removal function of the capacitive coupled hollow cathode plasma source for plasma polishing

✍ Scribed by Dasen Wang; Weiguo Liu; Yilong Wu; Lingxia Hang; Huadong Yu; Na Jin

• Book ID: 113846627
• Publisher: Elsevier
• Year: 2011
• Tongue: English
• Weight: 249 KB
• Volume: 19
• Category: Article
• ISSN: 1875-3892
• DOI: 10.1016/j.phpro.2011.06.183