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Highly selective etching of deep silica components using electron cyclotron resonance plasma

✍ Scribed by Margit Ferstl

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Development of a high-selectivity proces

✍ A. J. Stoltz; J. D. Benson; M. thomas; P. R. Boyd; M. Martinka; J. H. Dinan 📂 Article 📅 2002 🏛 Springer US 🌐 English ⚖ 175 KB

Dry etching of Hg1−xCdxTe using CH4/H2/A

✍ Robert C. Keller; M. Seelmann-Eggebert; H. J. Richter 📂 Article 📅 1996 🏛 Springer US 🌐 English ⚖ 984 KB