Development of a high-selectivity process for electron cyclotron resonance plasma etching of II-VI semiconductors

✍ Scribed by A. J. Stoltz; J. D. Benson; M. thomas; P. R. Boyd; M. Martinka; J. H. Dinan

• Book ID: 107452877
• Publisher: Springer US
• Year: 2002
• Tongue: English
• Weight: 175 KB
• Volume: 31
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/s11664-002-0231-3