Electron cyclotron resonance plasma etching of materials for magneto-resistive random access memory applications

✍ Scribed by K. B. Jung; J. W. Lee; Y. D. Park; J. R. Childress; S. J. Pearton; M. Jenson; A. T. Hurst

• Book ID: 107457469
• Publisher: Springer US
• Year: 1997
• Tongue: English
• Weight: 149 KB
• Volume: 26
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/s11664-997-0076-x