Highly reliable high-k gate dielectrics with gradual Hf-profile in the HfO2/SiO2 interface region

✍ Scribed by Kunihiko Iwamoto; Wataru Mizubayashi; Arito Ogawa; Toshihide Nabatame; Hideki Satake; Akira Toriumi

• Book ID: 108269548
• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 271 KB
• Volume: 50
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/j.sse.2006.04.013