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High-temperature DC characteristics of AlxGa0.52-x In0.48P/GaAs heterojunction bipolar transistors grown by metal organic vapor phase epitaxy

โœ Scribed by Ho-Kwang Yow; Houston, P.A.; Chee-Mun Sidney Ng; Button, C.; Roberts, J.S.


Book ID
114536341
Publisher
IEEE
Year
1996
Tongue
English
Weight
702 KB
Volume
43
Category
Article
ISSN
0018-9383

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In 0.48 Ga 0.52 P/In 0.20 Ga 0.80 As/GaAs pseudomorphic high electron mobility transistor (p-HEMT) structures were grown by solid-source molecular beam epitaxy (SSMBE) using a valved phosphorus cracker cell. The electron mobility and sheet carrier density at room temperature were 1700 cm 2 /Vs and 3