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High-temperature active oxidation of CVD-Si3N4 in ArO2 atmosphere

✍ Scribed by Takayuki Narushima; Yasutaka Iguchi; Takashi Goto; Toshio Hirai; Yoshio Yokoyama

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
250 KB
Volume
53-56
Category
Article
ISSN
0167-2738

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