This critical overview presents experimental methods for solving most frequent strucutral problems of mono-crystalline thin films and layered systems:<BR>thickness, crystalline state, strain distribution, interface quality and other properties. A unified theoretical approach based on kinematical and
High-Resolution X-Ray Scattering: From Thin Films to Lateral Nanostructures
β Scribed by Ullrich Pietsch, VΓ‘clav HolΓ½, Tilo Baumbach (auth.)
- Publisher
- Springer-Verlag New York
- Year
- 2004
- Tongue
- English
- Leaves
- 409
- Series
- Advanced Texts in Physics
- Edition
- 2
- Category
- Library
No coin nor oath required. For personal study only.
β¦ Synopsis
During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not apΒ pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.
β¦ Table of Contents
Front Matter....Pages I-XVI
Front Matter....Pages 1-3
Elements for Designing an X-Ray Diffraction Experiment....Pages 5-29
Diffractometers and Reflectometers....Pages 31-42
Scans and Resolution in Angular and Reciprocal Space....Pages 43-58
Front Matter....Pages 59-62
Basic Principles....Pages 63-74
Kinematical Theory....Pages 75-95
Dynamical Theory....Pages 97-121
Semikinematical Theory....Pages 123-135
Front Matter....Pages 137-141
Determination of Layer Thicknesses of Single Layers and Multilayers....Pages 143-178
Lattice Parameters and Strains in Epitaxial Layers and Multilayers....Pages 179-203
Diffuse Scattering From Volume Defects in Thin Layers....Pages 205-233
X-Ray Scattering by Rough Multilayers....Pages 235-272
Front Matter....Pages 273-278
X-Ray Scattering by Artificially Lateral Semiconductor Nanostructures....Pages 279-316
Strain Analysis in Periodic Nanostructures....Pages 317-352
X-Ray Scattering from Self-Organized Structures....Pages 353-387
Back Matter....Pages 389-408
β¦ Subjects
Surfaces and Interfaces, Thin Films;Optical and Electronic Materials;Nanotechnology;Optics, Optoelectronics, Plasmonics and Optical Devices
π SIMILAR VOLUMES
With contributions by Paul F. Fewster and Christoph GenzelWhile X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thi
While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, b
Inelastic scattering of X-rays with very high energy resolution has finally become possible thanks to a new generation of high-intensity X-ray sources. This development marks the end to the traditional belief that low energy excitations like lattice vibrations cannot be resolved directly with X-rays