๐”– Bobbio Scriptorium
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High rate primary ion beam deposition of a-Si:H films

โœ Scribed by H. Frey


Publisher
Springer
Year
1988
Tongue
English
Weight
371 KB
Volume
47
Category
Article
ISSN
1432-0630

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Very High Frequency (VHF) plasma enhanced chemical vapour deposition (PECVD) has been applied to hydrogenated amorphous silicon (a-Si:H) and hydrogenated amorphous silicon nitride (a-SiN x :H) films for thin film transistors (TFTs) fabrication. The effect of the excitation frequency on the depositio