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Deposition rate, ion bombardment and gap states density in glow discharge a-Si:H,F films

โœ Scribed by Roberto Murri; Luigi Schiavulli; Giovanni Bruno; Pio Capezzuto; Gianni Grillo


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
465 KB
Volume
182
Category
Article
ISSN
0040-6090

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