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Ion bombardment effects in plasma deposition of hydrogenated amorphous silicon carbide films: A comparative study of d.c. and r.f. discharges

✍ Scribed by Y. Catherine; A. Zamouche; J. Bullot; M. Gauthier


Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
924 KB
Volume
109
Category
Article
ISSN
0040-6090

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