High rate deposition of a-Si:H and a-SiN
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T Takagi; K Takechi; Y Nakagawa; Y Watabe; S Nishida
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Article
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1998
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Elsevier Science
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English
⚖ 322 KB
Very High Frequency (VHF) plasma enhanced chemical vapour deposition (PECVD) has been applied to hydrogenated amorphous silicon (a-Si:H) and hydrogenated amorphous silicon nitride (a-SiN x :H) films for thin film transistors (TFTs) fabrication. The effect of the excitation frequency on the depositio