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High rate PECVD of a-Si alloys on large areas

✍ Scribed by S. Röhlecke; R. Tews; A. Kottwitz; K. Schade


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
352 KB
Volume
74-75
Category
Article
ISSN
0257-8972

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Very High Frequency (VHF) plasma enhanced chemical vapour deposition (PECVD) has been applied to hydrogenated amorphous silicon (a-Si:H) and hydrogenated amorphous silicon nitride (a-SiN x :H) films for thin film transistors (TFTs) fabrication. The effect of the excitation frequency on the depositio