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High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO2films: the effect of repetition frequency

✍ Scribed by J. Šícha; D. Heřman; J. Musil; Z. Strýhal; J. Pavlík


Book ID
107470178
Publisher
Springer-Verlag
Year
2007
Tongue
English
Weight
510 KB
Volume
2
Category
Article
ISSN
1931-7573

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## Abstract In this investigation, transparent TiO~2~ films were deposited at various substrate temperatures: RT, 200 °C, 300 °C and 400 °C by DC reactive magnetron sputtering technique to study the photocatalytic activity by the measurement of decomposition of methanol under UV–visible irradiation