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Effect of substrate temperature on the photocatalytic activity of sputtered TiO2thin film

✍ Scribed by Hossain, M. F. ;Biswas, S. ;Takahashi, T. ;Kubota, Y. ;Fujishima, A.

Publisher: John Wiley and Sons
Year: 2008
Tongue: English
Weight: 577 KB
Volume: 205
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.200778892

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✦ Synopsis

Abstract

In this investigation, transparent TiO~2~ films were deposited at various substrate temperatures: RT, 200 °C, 300 °C and 400 °C by DC reactive magnetron sputtering technique to study the photocatalytic activity by the measurement of decomposition of methanol under UV–visible irradiation. The decomposition efficiency of TiO~2~ film increases initially with the increase of substrate temperature to 200 °C, but it decreases for the higher substrate temperatures. The correlation between the photocatalytic activity and the crystallographic, optical and morphological properties of TiO~2~ thin films was investigated in detail. Results show that increase of substrate temperature enhances crystallinity but reduces surface roughness. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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