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High quality ultrathin dielectric films grown on silicon in a nitric oxide ambient

✍ Scribed by Yao, Z.‐Q.; Harrison, H. B.; Dimitrijev, S.; Sweatman, D.; Yeow, Y. T.


Book ID
118013753
Publisher
American Institute of Physics
Year
1994
Tongue
English
Weight
619 KB
Volume
64
Category
Article
ISSN
0003-6951

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