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High-performance strained-SOI CMOS devices using thin film SiGe-on-insulator technology

✍ Scribed by Mizuno, T.; Sugiyama, N.; Tezuka, T.; Numata, T.; Takagi, S.

Book ID: 114617056
Publisher: IEEE
Year: 2003
Tongue: English
Weight: 643 KB
Volume: 50
Category: Article
ISSN: 0018-9383
DOI: 10.1109/ted.2003.812149

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