Fabrication of thick, high-quality strained SiGe layer on ultra-thin silicon-on-insulator and modeling of film strain

✍ Scribed by Zengfeng Di; Miao Zhang; Weili Liu; Chenglu Lin; Paul K. Chu

• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 285 KB
• Volume: 7
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/j.mssp.2004.09.002