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High Etch Rate Gallium Nitride Processing Using an Inductively Coupled Plasma Source

✍ Scribed by Ryan, M. E. ;Camacho, A. C. ;Bhardwaj, J. K.

Publisher: John Wiley and Sons
Year: 1999
Tongue: English
Weight: 113 KB
Volume: 176
Category: Article
ISSN: 0031-8965
DOI: 10.1002/(sici)1521-396x(199911)176:1<743::aid-pssa743>3.0.co;2-e

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