𝔖 Bobbio Scriptorium
✦   LIBER   ✦

High-density silicon nitride thin film in PECVD

✍ Scribed by Brigitte Reynes; Jean Claude Bruyère


Book ID
108028087
Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
324 KB
Volume
32
Category
Article
ISSN
0924-4247

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Neural network modeling of PECVD silicon
✍ S. Ghosh; P.K. Dutta; D.N. Bose 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 488 KB

In this paper a neural network based technique has been developed to model a plasma enhanced chemical vapor deposition (PECVD) silicon nitride process. The study covers the range of normal input parameters used for PECVD silicon nitride ®lms. These ®lm compositions range from nitrogen-rich to silico

Processing and characterisation of PECVD
✍ Xiumiao Zhang; Koubao Ding; Ailing Yang; Diling Shao 📂 Article 📅 1996 🏛 John Wiley and Sons 🌐 English ⚖ 268 KB

Amorphous Si-N films are synthesised from an NH,/SiH, gas mixture by plasma-enhanced chemical vapour deposition (PECVD) at fixed radio frequency (13.56 MHz) and total gas pressure (3424 Torr). The variable process parameters and their ranges are: (i) substrate temperature, 200-400 "C; (ii) RF power