✦ LIBER ✦

High Current Target for Positive Ion Accelerators

✍ Scribed by Seiler, R. F.; Cleland, M. R.; Wegner, H. E.

Book ID: 117928192
Publisher: IEEE
Year: 1967
Tongue: English
Weight: 353 KB
Volume: 14
Category: Article
ISSN: 0018-9499
DOI: 10.1109/tns.1967.4324685

No coin nor oath required. For personal study only.

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Ion implantation is of great importance in semiconductor device fabrication. Owing to the increasing interest of" the microelectronic industry in the implantation of ions in the megaelectronvolt energy range, high energy beams are required. Furthermore, for several applications the implanted dose is