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High breakdown voltage AlGaN/GaN MIS-HFET with low leakage current

โœ Scribed by Masahiko Kuraguchi; Yoshiharu Takada; Wataru Saito; Ichiro Omura; Kunio Tsuda


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
109 KB
Volume
2
Category
Article
ISSN
1862-6351

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๐Ÿ“œ SIMILAR VOLUMES


Low leakage current in AlGaN/GaN HFETs w
โœ Oshimura, Yoshinori ;Sugiyama, Takayuki ;Takeda, Kenichiro ;Iwaya, Motoaki ;Take ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 343 KB

## Abstract AlGaN/GaN heterostructure fieldโ€effect transistors were grown by metalorganic vapor phase epitaxy on Feโ€doped GaN substrates with a preflow of the Mg source. We realized a low drain leakage current, 1.05โ€‰ยตA/mm, at __V__~DS~โ€‰=โ€‰20โ€‰V and __V__~GS~โ€‰=โ€‰โˆ’5โ€‰V with __L__~GD~โ€‰=โ€‰3โ€‰ยตm. This leakage