Low leakage current in AlGaN/GaN HFETs w
Low leakage current in AlGaN/GaN HFETs with preflow of Mg source before growth of u-GaN buffer layer
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Oshimura, Yoshinori ;Sugiyama, Takayuki ;Takeda, Kenichiro ;Iwaya, Motoaki ;Take
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Article
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2011
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John Wiley and Sons
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English
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## Abstract AlGaN/GaN heterostructure fieldโeffect transistors were grown by metalorganic vapor phase epitaxy on Feโdoped GaN substrates with a preflow of the Mg source. We realized a low drain leakage current, 1.05โยตA/mm, at __V__~DS~โ=โ20โV and __V__~GS~โ=โโ5โV with __L__~GD~โ=โ3โยตm. This leakage