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High Aspect Ratio Silicon Wire Array Photoelectrochemical Cells

✍ Scribed by Maiolo, James R.; Kayes, Brendan M.; Filler, Michael A.; Putnam, Morgan C.; Kelzenberg, Michael D.; Atwater, Harry A.; Lewis, Nathan S.

Book ID
126235398
Publisher
American Chemical Society
Year
2007
Tongue
English
Weight
113 KB
Volume
129
Category
Article
ISSN
0002-7863

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## Abstract This paper presents a technique for fabricating high‐aspect‐ratio silicon dioxide pillars by electrochemical etching of n‐type silicon in hydrofluoric acid (HF) solutions. Basic process flow and etching conditions are described, which make it possible to obtain high‐aspect‐ratio pillar