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High aspect ratio silicon tips field emitter array

✍ Scribed by I.W. Rangelow; St. Biehl

Book ID
114155298
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
256 KB
Volume
57-58
Category
Article
ISSN
0167-9317

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## Abstract This paper presents a technique for fabricating high‐aspect‐ratio silicon dioxide pillars by electrochemical etching of n‐type silicon in hydrofluoric acid (HF) solutions. Basic process flow and etching conditions are described, which make it possible to obtain high‐aspect‐ratio pillar