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Hexamethyldisiloxane film as the bottom antireflective coating layer for ArF excimer laser lithography

โœ Scribed by Chen, Hsuen-Li ;Wang, Lon A.


Book ID
115348247
Publisher
The Optical Society
Year
1999
Tongue
English
Weight
108 KB
Volume
38
Category
Article
ISSN
1559-128X

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Hexamethyldisiloxane (HMDSO) is used as coating material in a conventional ECR-PECVD process. By simply adjusting the gas flow rate ratio, the material can be varied to have suitable optical constants for making bottom antireflective coating (BARC) layers working at both 248 nm and 193 nm wavelength