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Heterodyne holographic nanometer alignment for a wafer stepper

โœ Scribed by N. Nomura; K. Yamashita; K. Kubo; Y. Yamada; M. Suzuki


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
222 KB
Volume
11
Category
Article
ISSN
0167-9317

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Alignment accuracy evaluation of the X-r
โœ M. Suzuki; M. Fukuda; H. Tsuyuzaki ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 308 KB

The alignment accuracy of the X-ray stepper SS-1 for synchrotron radiation (SR) lithography was evaluated. The mark state changes whenever the process layer is deposited. The alignment mark can be classified into four types based on the mark composition of all the process layers in LSI manufacturing