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Heat treatment of rf sputtered CdS films for solar cell applications

✍ Scribed by I. Mártil; G. González-Díaz; F. Sánchez-Quesada


Publisher
Elsevier Science
Year
1985
Weight
329 KB
Volume
12
Category
Article
ISSN
0165-1633

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## Abstract Rf magnetron sputtering technique was employed for preparation of tantalum oxide films on quartz and crystalline silicon (111) substrates held at room temperature by sputtering of tantalum in an oxygen partial pressure of 1x10^‐4^ mbar. The films were annealed in air for an hour in the