The properties of thin CN x layers prepared by rapid thermal annealing (RTA) are compared with CN x layers obtained from N 2 plasma treatment. Carbon films of 6000 A Λthickness were deposited by magnetron sputtering system on p-type silicon substrates. The samples were treated in an RTA system in N
β¦ LIBER β¦
Hardness of C, CNx and AlN thin films after rapid thermal annealing
β Scribed by G. Beshkov; G.P. Vassilev; M.R. Elizalde; T. Gomez-Acebo
- Book ID
- 114193709
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 315 KB
- Volume
- 82
- Category
- Article
- ISSN
- 0254-0584
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