Semiconductor technology is the basis of today's microelectronics industry with its many impacts on our modern life, i.e. computer and communication technology. This two-volume handbook covers the basics of semiconductor processing technology, which are as essential for the design of new microelectronic devices as the fundamental physics.
Volume 1 'Electronic Structure and Properties' covers the structure and properties of semiconductors, with particular emphasis on concepts relevant to semiconductor technology.
Volume 2 'Processing of Semiconductors' deals with the enabling materials technology for the electronics industry. World-renowned authors have contributed to this unique treatment of the processing of semiconductors and related technologies.
Of interest to physicists and engineers in research and in the electronics industry, this is a valuable reference source and state-of-the-art review by the world's top authors.
Content:
Chapter 1 Band Theory Applied to Semiconductors (pages 1โ67): Michel Lannoo
Chapter 2 Optical Properties and Charge Transport (pages 69โ120): R. G. Ulbrich
Chapter 3 Intrinsic Point Defects in Semiconductors 1999 (pages 121โ165): George D. Watkins
Chapter 4 Deep Centers in Semiconductors (pages 167โ229): Helmut Feichtinger
Chapter 5 Point Defects, Diffusion, and Precipitation (pages 231โ290): T. Y. Tan and U. Gosele
Chapter 6 Dislocations (pages 291โ376): Helmut Alexander and Helmar Teichler
Chapter 7 Grain Boundaries in Semiconductors (pages 377โ451): Jany Thibault, Jean?Luc Rouviere and Alain Bourret
Chapter 8 Interfaces (pages 453โ540): R. Hull, A. Ourmazd, W. D. Rau, P. Schwander, M. L. Green and R. T. Tung
Chapter 9 Material Properties of Hydrogenated Amorphous Silicon (pages 541โ595): R. A. Street and K. Winer
Chapter 10 High?Temperature Properties of Transition Elements in Silicon (pages 597โ660): Wolfgang Schroter, Michael Seibt and Dieter Gilles
Chapter 11 Fundamental Aspects of SiC (pages 661โ713): Wolfgang J. Choyke and Robert P. Devaty
Chapter 12 New Materials: Semiconductors for Solar Cells (pages 715โ769): Hans Joachim Moller
Chapter 13 New Materials: Gallium Nitride (pages 771โ808): Eicke R. Weber, Joachim Kruger and Christian Kisielowski
Chapter 1 Silicon Processing (pages 1โ65): John G. Wilkes
Chapter 2 Compound Semiconductor Processing (pages 67โ109): J. Brian Mullin
Chapter 3 Epitaxial Growth (pages 111โ176): Thomas E Kuech and Michael A. Tischler
Chapter 4 Photolithography (pages 177โ263): Rainer Leuschner and Georg Pawlowski
Chapter 5 Selective Doping (pages 265โ289): Subhash Mahajan
Chapter 6 Etching Processes in Semiconductor Manufacturing (pages 291โ339): Kevin G. Oonohoe, Terry Turner and Kenneth A. Jackson
Chapter 7 Silicon Device Structures (pages 341โ390): Chun?Yen Chang and Simon M. Sze
Chapter 8 Compound Semiconductor Device Structures (pages 391โ406): William E. Stanchina and Juan E Lam
Chapter 9 Silicon Device Processing (pages 407โ487): Dim?Lee Kwong
Chapter 10 Compound Semiconductor Device Processing (pages 489โ605): John M. Parsey
Chapter 11 Integrated Circuit Packaging (pages 607โ647): Daniel I. Amey
Chapter 12 Interconnection Systems (pages 649โ681): Wulf Knausenberger