Growth of γ-Tungsten Oxide Whiskers by Vapor Deposition
✍ Scribed by E. G. WOLFF
- Book ID
- 110811210
- Publisher
- John Wiley and Sons
- Year
- 1965
- Tongue
- English
- Weight
- 431 KB
- Volume
- 48
- Category
- Article
- ISSN
- 0002-7820
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📜 SIMILAR VOLUMES
Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 °C. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W
The analysis of the time evolution of W spots deposited from WF6+H2 mixtures by an Ar+ laser reveals that at different partial pressure ratios different chemical pathways are preferred. For high p(H2)/p(WF6) ratios the rate limiting step is hydrogen desorption from the tungsten surface with an activ