๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Growth of TiO2 thin film by reactive RF magnetron sputtering using oxygen radical

โœ Scribed by H. Ogawa; T. Higuchi; A. Nakamura; S. Tokita; D. Miyazaki; T. Hattori; T. Tsukamoto

Book ID
116600477
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
227 KB
Volume
449
Category
Article
ISSN
0925-8388

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Photo-induced hydrophilic properties of
Photo-induced hydrophilic properties of reactive RF magnetron sputtered TiO2 thin films
โœ Junjie Xiong; Sachindra Nath Das; Sungyeon Kim; Jinhyong Lim; Hyun Choi; Jae-Min ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 576 KB

## Photo-induced hydrophilic Oxygen flow ratio Self cleaning TiO 2 thin films were deposited by reactive radio frequency magnetron sputtering of Ti target at low working pressure (1 mTorr) and various O 2 and Ar flow ratios (R O2 = O 2 /(O 2 + Ar)). Properties of TiO 2 films were measured by field

Deposition of Ag nanostructures on TiO2
Deposition of Ag nanostructures on TiO2 thin films by RF magnetron sputtering
โœ J. Zuo ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 587 KB

Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore