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Growth of H2O layers on an ultra-thin Al2O3 film: from monomeric species to ice

✍ Scribed by G. Tzvetkov; Y. Zubavichus; G. Koller; Th. Schmidt; C. Heske; E. Umbach; M. Grunze; M.G. Ramsey; F.P. Netzer

Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 528 KB
Volume: 543
Category: Article
ISSN: 0039-6028
DOI: 10.1016/s0039-6028(03)01029-x

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✦ Synopsis

Adsorption of water on an ultra-thin alumina film grown epitaxially onto NiAl(1 1 0) has been investigated by temperature-programmed desorption, work function measurements, ultraviolet photoelectron spectroscopy, and highresolution X-ray photoelectron spectroscopy as a function of surface coverage at 100 K. At low coverages monomeric H 2 O species are adsorbed and it is proposed that the oxygen lone pair orbitals interact weakly via polarisation forces with the Al 3þ cations of the second layer. No indication for the dissociation of H 2 O and the formation of OH À species has been found. For intermediate coverages clustering of H 2 O molecules occurs and the growth of a three-dimensional ice layer is observed. Care has to be exercised in photoemission experiments of ice layers, since UV photon-induced dissociation of H 2 O in thicker ice layers is indicated.

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