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Growth of CuInSe2 by two magnetron sputtering techniques

✍ Scribed by A. Rockett; T.C. Lommasson; P. Campos; L.C. Yang; H. Talieh


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
857 KB
Volume
171
Category
Article
ISSN
0040-6090

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Growth of Ni–Mn–Ga high-temperature shap
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Ni-Mn-Ga thin films have been fabricated by using magnetron sputtering technique under various substrate negative bias voltages. The effect of substrate negative bias voltage on the compositions and surface morphology of Ni-Mn-Ga thin films was systematically investigated by energy dispersive X-ray