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Growth and characterization of PbTe films by magnetron sputtering

✍ Scribed by A. Jdanov; J. Pelleg; Z. Dashevsky; R. Shneck

Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
339 KB
Volume
106
Category
Article
ISSN
0921-5107

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In this work a single Langmuir probe has been used to determine in-situ the plasma electronic temperature (T e ) and the electronic density (h e ) of an rf magnetron sputtering system used to grow CN x films. Sodium chloride substrates and a carbon target (99.999%) in a mixture of Ar/N 2 were used.