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Growth of aluminium films by low pressure chemical vapour deposition using tritertiarybutylaluminium

✍ Scribed by A.C. Jones; J. Auld; S.A. Rushworth; G.W. Critchlow

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 535 KB
Volume: 135
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(94)90753-6

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