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Growth mechanism of FeN films by means of an atmospheric pressure halide chemical vapor deposition

โœ Scribed by N Takahashi; Y Toda; A Ishibashi; T Nakamura


Book ID
114192392
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
123 KB
Volume
65
Category
Article
ISSN
0254-0584

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