## Abstract The model adopted for the simulation of a new industrial size type of horizontal cold wall reactor for epitaxial silicon carbide deposition is reviewed. The attention is focalized on the chemical mechanism adopted and on the comparison with some growth rate data and temperature profiles
β¦ LIBER β¦
Growth and Doping Modeling of SiC-CVD in a Horizontal Hot-Wall Reactor
β Scribed by S. Nishizawa; M. Pons
- Publisher
- John Wiley and Sons
- Year
- 2006
- Tongue
- English
- Weight
- 300 KB
- Volume
- 12
- Category
- Article
- ISSN
- 0948-1907
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