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Growth of thick and low-doped 4H-SiC epitaxial layers in a vertical radiant-heating VPE reactor

✍ Scribed by Hidekazu Tsuchida; Isaho Kamata; Tamotsu Jikimoto; Kunikazu Izumi


Publisher
John Wiley and Sons
Year
2002
Tongue
English
Weight
380 KB
Volume
138
Category
Article
ISSN
0424-7760

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