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Growth and characterization of polycrystalline Si films prepared by hot-wire chemical vapor deposition

โœ Scribed by Dong-Sing Wuu; Shui-Yang Lien; Hsin-Yuan Mao; Bing-Rui Wu; In-Cha Hsieh; Pin-Chuan Yao; Jui-Hao Wang; Wen-Chun Chen


Book ID
108288917
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
211 KB
Volume
498
Category
Article
ISSN
0040-6090

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Preparation of Caโ€“Siโ€“O films by chemical
โœ Shekhar Nath; Rong Tu; Takashi Goto ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 747 KB

Ca-Si-O films were prepared by chemical vapor deposition using calcium dipivaloylmethanates (Ca(dpm) 2 ) and tetraethyl orthosilicate (TEOS). The effects of the Si to Ca precursor molar ratio (R Si/Ca ) and the substrate temperature (T sub ) on the crystal phase, microstructure and deposition rate o