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Growth and characterization of Al2O3thin films for the buffer insulator in Pt/SrBi2Nb2O9/Al2O3/Si ferroelectric gate oxide structure

✍ Scribed by Hoon Sang Choi; Geun-Sik Lim; Jong Han Lee; You Min Jang; Dong Chul Yoo; Jeong Yong Lee; In-Hoon Choi

No coin nor oath required. For personal study only.

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