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Growth and characterization of Al2O3insulator gate on p-InP and p-Si by metallorganic chemical vapour deposition at low temperatures

โœ Scribed by T. W. Kim; H. Lim; Y. D. Zheng; A. A. Reeder; B. D. Mccombe


Publisher
Springer
Year
1992
Tongue
English
Weight
358 KB
Volume
27
Category
Article
ISSN
0022-2461

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