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Growth and characterization of 4H–SiC in vertical hot-wall chemical vapor deposition

✍ Scribed by K Fujihira; T Kimoto; H Matsunami

Book ID: 108341951
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 272 KB
Volume: 255
Category: Article
ISSN: 0022-0248
DOI: 10.1016/s0022-0248(03)01245-4

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