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Grain Growth Studies of Silicon Nitride Dispersed in an Oxynitride Glass

✍ Scribed by Martin Krämer; Michael J. Hoffmann; Günter Petzow

Book ID
110826317
Publisher
John Wiley and Sons
Year
1993
Tongue
English
Weight
730 KB
Volume
76
Category
Article
ISSN
0002-7820

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📜 SIMILAR VOLUMES

The effect of hydrogen content on silico
The effect of hydrogen content on silicon coordination in silicon oxynitrides: An Auger parameter study
✍ J. C. Rivière; J. A. A. Crossley 📂 Article 📅 1990 🏛 John Wiley and Sons 🌐 English ⚖ 586 KB

## Abstract Silicon oxynitride films prepared by plasma‐enhanced chemical vapour deposition (PECVD), with compositions in the range O/N = 0 to O/N = 0.89, and containing amounts of hydrogen in the range H(H + O + N) = 0.07–0.31, have been studied by measurement of the Auger parameter α = __E__~K~(S